Professor Clarke's Group

Students:

Stefanie Chiras: Electromigration and residual stresses in interconnects.
Ed Etzkorn:
Michael Hufer:
Chongyang Luo:
Phil Tavernier:
Paul Verghese: Thin film varistors and electrical breakdown effects.
Hien Vu:
Yongbo Wang:
Jessica Xu: Interfacial Decohesion of Interconnects in Microelectronic circuits. (MICRO support from Intel).

Postdoctoral Researchers and Visiting Scientists:

Carsten Mennicke:
Xiao Peng:
Vladimir Tolpygo: Ferrous Metals Institute, Moscow. The development of stresses during the oxidation of metals with and without thermal barrier coatings.

Clarke home page